An Si wire array waveguide grating wavelength demultiplexer fabricated using immersion ArF lithography is reported. The tilt directions of the input and output star couplers are aligned in the same direction to avoid phase error generated at the curved waveguides. A 16 channel device with 200 GHz wavelength spacing was fabricated.
Inspec keywords: argon compounds; optical couplers; immersion lithography; diffraction gratings; silicon; elemental semiconductors; demultiplexing equipment; optical waveguides
Other keywords: wire array waveguide grating; frequency 200 GHz; input star couplers; phase error generation; Si; parallel star coupler; output star couplers; excimer immersion lithography; ArF; wavelength demultiplexer fabricated
Subjects: Lithography (semiconductor technology); Optical waveguides; Multiplexing and switching in optical communication