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Dr Angel Abusleme, from Pontificia Universidad Catolica de Chile, talks about the work behind his Letter ‘Mismatch of lateral field metal-oxide-metal capacitors in 180 nm CMOS process’ on page 286.

http://iet.metastore.ingenta.com/content/journals/10.1049/el.2012.0515
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Mismatch of lateral field metal-oxide-metal capacitors in 180 nm CMOS process
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