Frequency performance enhancement of AlGaN/GaN HEMTs on diamond

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Frequency performance enhancement of AlGaN/GaN HEMTs on diamond

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The performance of an AlGaN/GaN high electron mobility transistor (HEMT) on diamond substrate is reported. Presented is a device with a gate footprint LG=40 nm and a periphery WG=100 µm that exhibits fT=85 GHz and fmax=95 GHz. It is believed that this represents the best frequency performance of a GaN-on-diamond HEMT.

Inspec keywords: high electron mobility transistors; aluminium compounds; gallium compounds; III-V semiconductors

Other keywords: C; AlGaN-GaN; gate footprint; frequency performance; diamond substrate; HEMT; high electron mobility transistor

Subjects: Other field effect devices

References

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      • Francis, D., Wasserbauer, J., Faili, F., Babić, D., Ejeckam, F., Hong, W., Specht, P., Weber, E.R.: `GaN HEMT epilayers on diamond substrates: recent progress', Proc. CS MANTECH, May 2007, Austin, TX, USA, p. 133–136.
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      • R. Chu , L. Shen , N. Fichtenbaum , D. Brown , Z. Chen , S. Keller , S.P. DenBaars , U.K. Mishra . V-gate GaN HEMTs for X-band power applications. IEEE Electron Device Lett. , 9 , 974 - 976
http://iet.metastore.ingenta.com/content/journals/10.1049/el.2009.1122
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