IEE Colloquium on `Applications of Plasma Technology to Surface Processing - Recent Developments in Modelling and Diagnostics for Process Control and Optimization'

Buy conference proceeding
(plus tax if applicable)
  • Location: London, UK
  • Conference date: 30 March 1995
  • Conference number: 1995/149
  • The following topics were dealt with: plasma modelling; afterglow plasmas; intense plasma source discharges; plasma CVD modelling and characterization; glow discharge modelling; RF reactor control diagnostics; dusty plasmas

8 items found

  • General introduction to the modelling of real plasmas - I
  • Gas phase and surface modelling of nitriding afterglow plasmas
  • Modelling of intense plasma source discharges in one and two dimensions
  • Gas phase and surface modelling of diamond-like carbon deposition reactors
  • Plasma characterisation in PECVD deposition of diamond
  • Atmospheric pressure glow discharges. Modelling and experimental data
  • Plasma diagnostics for monitoring and control
  • Dusty plasmas - a theoretical charge model and industrial applications
Items per page 20 | 50 | 100
This is a required field
Please enter a valid email address