Plasma diagnostics for monitoring and control
Plasma diagnostics for monitoring and control
- Author(s): N.St.J. Braithwaite ; H.J. Phillips ; A.A. Hopgood ; P.D. Picton
- DOI: 10.1049/ic:19950908
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IEE Colloquium on `Applications of Plasma Technology to Surface Processing - Recent Developments in Modelling and Diagnostics for Process Control and Optimization' — Recommend this title to your library
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- Author(s): N.St.J. Braithwaite ; H.J. Phillips ; A.A. Hopgood ; P.D. Picton Source: IEE Colloquium on `Applications of Plasma Technology to Surface Processing - Recent Developments in Modelling and Diagnostics for Process Control and Optimization', 1995 page ()
- Conference: IEE Colloquium on `Applications of Plasma Technology to Surface Processing - Recent Developments in Modelling and Diagnostics for Process Control and Optimization'
As part of manufacturing optimisation, there is a need for a suite of diagnostics able to monitor relevant plasma and surface parameters working within a framework capable of making intelligent deductions and directing appropriate actions. This report concerns the use of an artificial intelligence (AI) approach to plasma process control using a number of plasma diagnostics in situ surface diagnostics could easily be incorporated, but are not considered here. Specific examples are taken from a project concerned with AI control of the deposition of carbonaceous films from a radio frequency plasma. (3 pages)
Inspec keywords: plasma-wall interactions; intelligent control; process control; plasma diagnostics
Subjects: Control engineering computing; Electric and magnetic plasma diagnostic techniques, probes; Plasma equilibrium and confinement; Solid state-plasma interactions; Control of physical instruments
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