FSS array generation by optical means
FSS array generation by optical means
- Author(s): D.S. Lockyer ; J.C. Vardaxoglou ; M.J. Kearney
- DOI: 10.1049/cp:19990034
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- Author(s): D.S. Lockyer ; J.C. Vardaxoglou ; M.J. Kearney Source: IEE National Conference on Antennas and Propagation, 1999 p. 132 – 135
- Conference: IEE National Conference on Antennas and Propagation
- DOI: 10.1049/cp:19990034
- ISBN: 0 85296 713 6
- Location: York, UK
- Conference date: 31 March-1 April 1999
- Format: PDF
We have demonstrated a basic technique for optically generating arrays of periodic grids as a pseudo-metallic, electron-hole plasma region within a semiconductor wafer. The wafers used were high resistivity silicon to give dielectric-like dark behaviour, in order to contrast with the generated plasma. The theory of the work is based on the characterisation of the plasma by means of its surface impedance, which in turn is dependent on the complex permittivity. We have demonstrated theoretically, generation dimensions. Results have been presented in the frequency range 18-40 GHz to confirm that grids have been optically cast onto the wafers using negative image masks of the desired pattern.
Inspec keywords: elemental semiconductors; photolithography; frequency selective surfaces; microstrip antenna arrays; planar antenna arrays; permittivity; masks; millimetre wave antenna arrays; semiconductor plasma; periodic structures; silicon; electric impedance
Subjects: Antenna arrays; Lithography (semiconductor technology)
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