Generation and exploitation of high-order OAM beams for anti-counterfeiting applications
Generation and exploitation of high-order OAM beams for anti-counterfeiting applications
- Author(s): F. Romanato ; G. Ruffato ; M. Massari ; M. Carli ; E. Gazzola ; M. Gintoli ; A. Sonato ; D. Cassese
- DOI: 10.1049/cp.2015.0171
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- Author(s): F. Romanato ; G. Ruffato ; M. Massari ; M. Carli ; E. Gazzola ; M. Gintoli ; A. Sonato ; D. Cassese Source: 2015 Fotonica AEIT Italian Conference on Photonics Technologies, 2015 page ()
- Conference: 2015 Fotonica AEIT Italian Conference on Photonics Technologies
- DOI: 10.1049/cp.2015.0171
- ISBN: 978-1-78561-068-4
- Location: Turin, Italy
- Conference date: 6-8 May 2015
- Format: PDF
Inspec keywords: photoresists; electron beam lithography; iterative methods; optical design techniques; copy protection; polynomials; optical testing; optical polymers; Fourier transforms; diffractive optical elements; computer-generated holography
Subjects: Optical materials; Holography; Data security; Optical polymers and other organic optical materials; Holographic optical elements; holographic gratings; Optical system design; Computer-generated holography; Optical testing techniques