Solar cells based on atomic layer deposition
Solar cells based on atomic layer deposition
- Author(s): Xiaolan Sun ; Chao Li ; Yanhua Dong ; Xiaohong Liu
- DOI: 10.1049/cp.2010.1227
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- Author(s): Xiaolan Sun ; Chao Li ; Yanhua Dong ; Xiaohong Liu Source: 9th International Conference on Optical Communications and Networks (ICOCN 2010), 2010 p. 362 – 365
- Conference: 9th International Conference on Optical Communications and Networks (ICOCN 2010)
- DOI: 10.1049/cp.2010.1227
- ISBN: 978-1-84919-314-6
- Location: Nanjing, China
- Conference date: 24-27 Oct. 2010
- Format: PDF
The advantages of atomic layer deposition (ALD) include highly controlled deposition parameters, deposition uniformity, ultra-precise film thickness and good step coverage. Its prominent characteristics have drew attention to researchers in the fields of solar cells. The heterojunction, core-shell structure and surface passivation of solar cells can be preparated by ALD to get better system performance. For example, the photoelectric conversion efficiency is improved by reducing electrons and holes recombination and protecting the cells to fulfill the utilization of energy.
Inspec keywords: solar cells; atomic layer deposition
Subjects: Vacuum deposition; Solar cells and arrays; Chemical vapour deposition; Photoelectric conversion; solar cells and arrays; Vacuum deposition; Chemical vapour deposition
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