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The advantages of atomic layer deposition (ALD) include highly controlled deposition parameters, deposition uniformity, ultra-precise film thickness and good step coverage. Its prominent characteristics have drew attention to researchers in the fields of solar cells. The heterojunction, core-shell structure and surface passivation of solar cells can be preparated by ALD to get better system performance. For example, the photoelectric conversion efficiency is improved by reducing electrons and holes recombination and protecting the cells to fulfill the utilization of energy.