Pulsed EM-field scattering by bounded and narrow screens in a layered embedding
The need for efficient and controlled synthesis of thin-film structures that are encountered in various applications of electronics and semiconductor industries (e.g. microelectronic circuits, integrated optical devices) puts severe demands on electromagnetic (EM) solvers for achieving their EM scattering characteristics. Such structures typically consist of highly conductive layers located in a piecewise homogeneous embedding, which cannot be directly analyzed with the aid of the Cagniard-DeHoop method of moments (CdH-MoM) formulation introduced in Chapter 8. Therefore, it is shown in this chapter how the CdH-MoM can be generalized, thus providing an efficient computational tool for analyzing the pulsed EM scattering by bounded, highly contrasting thin sheets on a layered background. For the sake of clarity, the methodology is illustrated based on the analysis of EM-penetrable sheets supporting electric currents only. The incorporation of combined effects of both electric and magnetic currents flowing on metasurfaces can be handled along similar lines.
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