In this book chapter the properties of Al₂O₃ based p⁺ surface passivation is described, focusing on the impact of deposition conditions, annealing sequence, capping layer material, Al₂O₃ thickness, and surface morphology.

Chapter Contents:

• 9.1 History of n-PERT solar cells
• 9.2 Al2O3 passivation for n-PERT cells
• 9.2.1 Overview of passivation layers for p+-type silicon surfaces
• 9.2.2 Al2O3 for n-PERT: deposition, annealing sequence, and capping layers
• 9.2.3 Al2O3 for n-PERT: thickness dependence
• 9.2.4 Al2O3 for n-PERT: surface morphology dependence
• 9.3 Conclusions
• References

Inspec keywords: alumina; surface morphology; annealing; passivation; solar cells; semiconductor industry; silicon; elemental semiconductors

Other keywords: Al₂O₃ passivation; Al₂O₃ ; deposition conditions; thickness; n-PERT cells; Si; annealing sequence; n-type passivated emitter and rear totally diffused cells; Al₂O₃ based p⁺surface passivation; capping layer material; industrial solar cells; surface morphology

Subjects: Photoelectric conversion; solar cells and arrays; Annealing processes; Optoelectronics manufacturing; Solar cells and arrays; Annealing processes in semiconductor technology; Heat treatment; Surface treatment and degradation in semiconductor technology; Solid surface structure; Surface treatment and coating techniques; Semiconductor industry; Surface treatment (semiconductor technology); Other heat and thermomechanical treatments