The author provides a general background on atmospheric pressure chemical vapor deposition (APCVD) of Al2O3, from its origins to more recent research, focusing on surface passivation applications for solar cells and the composition and structure of the APCVD Al2O3-Si interface.
Atmospheric pressure chemical vapor deposition of aluminum oxide for silicon surface passivation—background and materials science, Page 1 of 2
< Previous page Next page > /docserver/preview/fulltext/books/po/pbpo106e/PBPO106E_ch6-1.gif /docserver/preview/fulltext/books/po/pbpo106e/PBPO106E_ch6-2.gif