Your browser does not support JavaScript!



For access to this article, please select a purchase option:

Buy chapter PDF
(plus tax if applicable)
Buy Knowledge Pack
10 chapters for $120.00
(plus taxes if applicable)

IET members benefit from discounts to all IET publications and free access to E&T Magazine. If you are an IET member, log in to your account and the discounts will automatically be applied.

Learn more about IET membership 

Recommend Title Publication to library

You must fill out fields marked with: *

Librarian details
Your details
Why are you recommending this title?
Select reason:
Surface Passivation of Industrial Crystalline Silicon Solar Cells — Recommend this title to your library

Thank you

Your recommendation has been sent to your librarian.

The authors review developments in the use of PECVD in the growth of AlOx layers for solar cells. They consider the microwave PECVD and inductively coupled plasma PECVD methods, and the characteristics of layers grown by the 2 techniques, Si surface passivation, and solar cell applications.

Chapter Contents:

  • 5.1 Introduction
  • 5.1.1 Atomic layer deposition and earlier work
  • 5.1.2 Alternatives to classical ALD
  • 5.1.3 PECVD deposition techniques
  • 5.2 Plasma and layer characteristics of MW-PECVD
  • 5.2.1 Plasma characteristics
  • 5.2.2 Homogeneity of the process
  • 5.2.3 Layer characteristics
  • Potential application of aluminum oxide
  • Optical characteristics and chemical composition
  • Passivation of lowly doped p-type silicon surface
  • Passivation of highly doped p-type silicon surface
  • 5.3 Plasma and layer characteristics of ICP-PECVD
  • 5.3.1 Plasma simulations
  • 5.3.2 In-situ plasma monitoring investigation
  • 5.3.3 Ex-situ investigation of layer and interface properties
  • 5.4 Performance comparison with other techniques (P&M)
  • 5.4.1 Comparison between MW-, ICP-PECVD, and ALD
  • 5.4.2 Solar cell results
  • References

Inspec keywords: aluminium compounds; solar cells; passivation; surface recombination; plasma CVD

Other keywords: solar cells; Si; surface passivation; plasma-enhanced chemical vapor deposition; AlO; ICP-PECVD; microwave PECVD

Subjects: Photoelectric conversion; solar cells and arrays; Plasma applications in manufacturing and materials processing; Thin film growth, structure, and epitaxy; Surface treatment and degradation in semiconductor technology; Surface conductivity and carrier phenomena; Solar cells and arrays; Chemical vapour deposition; Surface treatment (semiconductor technology); Chemical vapour deposition

Preview this chapter:
Zoom in

PECVD-AlOx, Page 1 of 2

| /docserver/preview/fulltext/books/po/pbpo106e/PBPO106E_ch5-1.gif /docserver/preview/fulltext/books/po/pbpo106e/PBPO106E_ch5-2.gif

Related content

This is a required field
Please enter a valid email address