Material properties of AlOx for silicon surface passivation
The author focuses on the surface passivation mechanism of Al2O3 and how it is related to its material properties. The chapter starts off with a short description of the fundamentals of surface recombination stressing the importance of the electronic properties of the c-Si/Al2O3 interface with respect to defect density and fixed charge. Next, an overview is presented of the electronic properties for Al2O3 layers synthesised on c-Si substrates by various techniques. Finally, these electronic properties are related to the atomic-scale material properties for Al2O3 films with a particular focus on the, typically unintentional, presence of an interfacial silicon oxide film.
Material properties of AlOx for silicon surface passivation, Page 1 of 2
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