The book chapter reviews the process of spatial Al2O3 atomic layer deposition (ALD). Aspects covered include: time-based versus spatial methods; proof of principle spatial ALD; spatial ALD applications; from the proof of principle to InPassion® LAB; transform from Lab to Fab-InPassion® ALD; second generation-InPassion® ALD; combining the stack layers.
Spatial Al2O3 ALD: from Lab to Fab, Page 1 of 2
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