In this book chapter it is shown that Al₂O₃ deposition systems based on spatial ALD with wafer floatation are attractive for passivation of cSi solar cells in high-volume manufacturing. In principle, the throughput can be increased to 7,200 wafers/h; the limitation is not the ALD track, but the unloading automation.

Chapter Contents:

• 13.1 Introduction
• 13.2 High-level system specs
• 13.3 Levitrack system
• 13.4 Basic wafer transport theory
• 13.4.1 Shear force FQ
• 13.4.2 Gravitational force FG
• 13.4.3 Pressure force δP
• 13.4.4 Accuracy of the analytical model
• 13.4.5 Design impact
• 13.5 Comparison with experimental results
• 13.6 Lateral stability
• 13.7 Throughput enhancement
• 13.8 Spatial ALD process results
• 13.9 Conclusions
• Acknowledgment
• References

Inspec keywords: elemental semiconductors; atomic layer deposition; alumina; passivation; semiconductor industry; solar cells; silicon

Other keywords: crystalline silicon solar cells; Al₂O₃ deposition systems; wafer floatation; passivation; spatial atomic layer deposition; Levitrack; Al₂O₃ ; spatial ALD; cSi solar cells; one-pass ALD system; unloading automation; high-volume manufacturing; Si; throughput

Subjects: Vacuum deposition; Semiconductor industry; Surface treatment (semiconductor technology); Thin film growth, structure, and epitaxy; Solar cells and arrays; Surface treatment and degradation in semiconductor technology; Surface treatment and coating techniques; Photoelectric conversion; solar cells and arrays; Vacuum deposition; Optoelectronics manufacturing