Spatial atomic layer deposition of A12O3: Levitrack, a one-pass ALD system with throughputs exceeding 6,000 wafers/h
In this book chapter it is shown that Al2O3 deposition systems based on spatial ALD with wafer floatation are attractive for passivation of cSi solar cells in high-volume manufacturing. In principle, the throughput can be increased to 7,200 wafers/h; the limitation is not the ALD track, but the unloading automation.
Preview this chapter:
Spatial atomic layer deposition of A12O3: Levitrack, a one-pass ALD system with throughputs exceeding 6,000 wafers/h, Page 1 of 2
< Previous page Next page > /docserver/preview/fulltext/books/po/pbpo106e/PBPO106E_ch13-1.gif /docserver/preview/fulltext/books/po/pbpo106e/PBPO106E_ch13-2.gif