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Spatial atomic layer deposition of A12O3: Levitrack, a one-pass ALD system with throughputs exceeding 6,000 wafers/h

Spatial atomic layer deposition of A12O3: Levitrack, a one-pass ALD system with throughputs exceeding 6,000 wafers/h

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Surface Passivation of Industrial Crystalline Silicon Solar Cells — Recommend this title to your library

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In this book chapter it is shown that Al2O3 deposition systems based on spatial ALD with wafer floatation are attractive for passivation of cSi solar cells in high-volume manufacturing. In principle, the throughput can be increased to 7,200 wafers/h; the limitation is not the ALD track, but the unloading automation.

Chapter Contents:

  • 13.1 Introduction
  • 13.2 High-level system specs
  • 13.3 Levitrack system
  • 13.4 Basic wafer transport theory
  • 13.4.1 Shear force FQ
  • 13.4.2 Gravitational force FG
  • 13.4.3 Pressure force δP
  • 13.4.4 Accuracy of the analytical model
  • 13.4.5 Design impact
  • 13.5 Comparison with experimental results
  • 13.6 Lateral stability
  • 13.7 Throughput enhancement
  • 13.8 Spatial ALD process results
  • 13.9 Conclusions
  • Acknowledgment
  • References

Inspec keywords: elemental semiconductors; atomic layer deposition; alumina; passivation; semiconductor industry; solar cells; silicon

Other keywords: crystalline silicon solar cells; Al2O3 deposition systems; wafer floatation; passivation; spatial atomic layer deposition; Levitrack; Al2O3; spatial ALD; cSi solar cells; one-pass ALD system; unloading automation; high-volume manufacturing; Si; throughput

Subjects: Vacuum deposition; Semiconductor industry; Surface treatment (semiconductor technology); Thin film growth, structure, and epitaxy; Solar cells and arrays; Surface treatment and degradation in semiconductor technology; Surface treatment and coating techniques; Photoelectric conversion; solar cells and arrays; Vacuum deposition; Optoelectronics manufacturing

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