This book chapter gives an overview of industrial microwave PE CVD reactors starting at details of the used linear plasma sources and showing then, that a system of modular equipment can be constructed, covering a wide range of wafer throughput and customized backside passivation layer systems.

Chapter Contents:

• 12.1 Introduction
• 12.2 PE CVD reactor development leading to high throughput tools
• 12.2.1 Principle of plasma deposition with linear microwave plasma sources
• 12.2.2 Linear microwave plasma sources for PE CVD of aluminum oxide
• 12.2.3 Linear microwave plasma sources for PE CVD of silicon nitride
• 12.2.4 Reactors for combined PE CVD of aluminum oxide and silicon nitride for backside passivation
• 12.2.5 Reactors for front-and back-side PE CVD
• 12.2.6 Future high throughput reactors—limits and advantages
• 12.3 Experimental results
• 12.4 Summary
• References

Inspec keywords: passivation; reviews; silicon; alumina; plasma sources; production equipment; solar cells; chemical reactors; elemental semiconductors; plasma CVD

Other keywords: microwave PE CVD reactor; Al₂O₃ ; solar cell applications; modular equipment; Si; wafer throughput; linear plasma sources; aluminum oxide layers; customized backside passivation layer systems; overview; industrial high throughput fabrication; passivated solar cells

Subjects: Plasma sources; Chemical vapour deposition; Plasma applications in manufacturing and materials processing; Photoelectric conversion; solar cells and arrays; Semiconductor industry; Surface treatment and coating techniques; Thin film growth, structure, and epitaxy; Production equipment; Chemical vapour deposition; Optoelectronics manufacturing; Solar cells and arrays; Surface treatment (semiconductor technology); Surface treatment and degradation in semiconductor technology