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Microwave PE CVD reactor and process for industrial high throughput fabrication of aluminum oxide layers for solar cell applications

Microwave PE CVD reactor and process for industrial high throughput fabrication of aluminum oxide layers for solar cell applications

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This book chapter gives an overview of industrial microwave PE CVD reactors starting at details of the used linear plasma sources and showing then, that a system of modular equipment can be constructed, covering a wide range of wafer throughput and customized backside passivation layer systems.

Chapter Contents:

  • 12.1 Introduction
  • 12.2 PE CVD reactor development leading to high throughput tools
  • 12.2.1 Principle of plasma deposition with linear microwave plasma sources
  • 12.2.2 Linear microwave plasma sources for PE CVD of aluminum oxide
  • 12.2.3 Linear microwave plasma sources for PE CVD of silicon nitride
  • 12.2.4 Reactors for combined PE CVD of aluminum oxide and silicon nitride for backside passivation
  • 12.2.5 Reactors for front-and back-side PE CVD
  • 12.2.6 Future high throughput reactors—limits and advantages
  • 12.3 Experimental results
  • 12.4 Summary
  • References

Inspec keywords: passivation; reviews; silicon; alumina; plasma sources; production equipment; solar cells; chemical reactors; elemental semiconductors; plasma CVD

Other keywords: microwave PE CVD reactor; Al2O3; solar cell applications; modular equipment; Si; wafer throughput; linear plasma sources; aluminum oxide layers; customized backside passivation layer systems; overview; industrial high throughput fabrication; passivated solar cells

Subjects: Plasma sources; Chemical vapour deposition; Plasma applications in manufacturing and materials processing; Photoelectric conversion; solar cells and arrays; Semiconductor industry; Surface treatment and coating techniques; Thin film growth, structure, and epitaxy; Production equipment; Chemical vapour deposition; Optoelectronics manufacturing; Solar cells and arrays; Surface treatment (semiconductor technology); Surface treatment and degradation in semiconductor technology

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