Crystalline thin films for integrated laser applications
A review of the main thin film growth or deposition processes and the state of the art on the applications of crystalline dielectric thin films, especially in the laser field, were presented. The LPE growth technique, which has been described in detail, is particularly suitable for the growth of thin films of high optical quality intended for optical applications, which sometimes require thicknesses of up to several hundred microns. The experimental approach describing the growth process of thin films and their preparation was presented in a simple manner, based on concrete examples, such as the growth of well-known fluoride or oxide films. The fields of application of thin films and in particular thin crystalline dielectric films intended for optics are various, from fundamental research (metrology, quantum optics ...), to devices (lab on chip, microlaser ...), to biopho-tonics, to high-resolution 3D-imaging or the next generation of optical sensors for environment's control. Some of these applications already show the major role that thin-film materials will play in the development of new compact, integrated and even more efficient photonic devices. The next generation of regenerative laser amplifiers, very compact ultrafast pulse lasers, optical devices for quantum com-munications, high-performance scintillators or original magneto-optical devices are some examples of possible concrete developments that would be based on crys-talline dielectric thin films in the next few years
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