Inspec keywords: boron; arsenic; elemental semiconductors; annealing; ion implantation; silicon; semiconductor doping; phosphorus; gallium; antimony; electron beam applications

Other keywords: semiconductor doping; multiple-scan method; ion implantation; B implantation; solid solubility limit; four-point probe; P implantation; Ga implantation; dopant; isothermal electron-beam annealing; electrical activation; As implantation; electron-beam power; sheet resistance; Si; doping level; Sb implantation

Subjects: Doping and implantation of impurities; Semiconductor doping; Electron and positron effects; Elemental semiconductors