Inspec keywords: III-V semiconductors; wide band gap semiconductors; sputter etching; gallium compounds; surface roughness; light emitting diodes; etching; annealing

Other keywords: etch rates; radio-frequency power; optical intensity; GaN LEDs; fabricated LED; post-fabrication annealing; GaN; RIE; gallium nitride light; cost-effective fabrication method; reactive-ion etching system; surface roughness; conventional reactive-ion etching system

Subjects: II-VI and III-V semiconductors; Surface treatment (semiconductor technology); Annealing processes in semiconductor technology; Light emitting diodes