Fabrication of a nanophotonic quantum dot waveguide and photodetector integrated device
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- Author(s): L. Huang 1 ; M.C. Hegg 2 ; C.-J. Wang 2 ; L.Y. Lin 1
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View affiliations
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Affiliations:
1:
Department of Physics,
University of Washington
, Seattle
, USA
2: Department of Electrical Engineering, University of Washington , Seattle , USA
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Affiliations:
1:
Department of Physics,
University of Washington
, Seattle
, USA
- Source: Micro & Nano Letters, Volume 2, Issue 4, December 2007, p. 103 – 106, DOI: 10.1049/mnl:20070053, Online ISSN 1750-0443
© The Institution of Engineering and Technology
Published 28/07/2012
Abstract
The authors present the design and fabrication of a nanophotonic waveguide and photodetector integrated device by molecular self-assembly of nanocrystal quantum dots (QD) and two different nano-gap formation techniques, namely electromigration-induced break-junction technique and electron beam lithography nano-gap patterning. A QD waveguide with ∼50 nm width integrated with a nano-scale QD photodetector is achieved. A comparison is made between the two nano-gap techniques. In addition, a method to achieve high alignment accuracy for nanophotonic integration is discussed.
Inspec keywords: electromigration; integrated optics; self-assembly; electron beam lithography; photodetectors; nanoelectronics; optical waveguides; optoelectronic devices; quantum dots
Other keywords: molecular self-assembly; electron beam lithography; nanophotonic integration; nanophotonic quantum dot waveguide; nanocrystal quantum dots; electromigration-induced break-junction technique; nano-gap formation; photodetector integrated device
Subjects: Photodetectors; Integrated optics; Optical waveguides; Detection of radiation (bolometers, photoelectric cells, i.r. and submillimetre waves detection); Optical waveguides and couplers; Lithography (semiconductor technology); Integrated optics
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