access icon free Fabrication of nanochannels using underexposed nanoimprint method

Uniform arrays of nanochannels were made using an underexposed nanoimprint method. The nanotrenches were bended uniformly, and the degree of the collapse was controlled by the exposure time. After deposition of the sealing material, nanochannels with a dimension of 100 nm were successfully fabricated. The blocking problem was solved by adjusting the parameters of the gratings. The proposed fabrication technique can be very helpful in micro-/nanoanalysis systems.

Inspec keywords: nanofabrication; nanostructured materials; nanolithography

Other keywords: under-exposed nanoimprint; exposure time; uniform nanochannel arrays; nanoanalysis systems; nanochannel fabrication; nanotrenches; microanalysis systems; sealing material

Subjects: Nanometre-scale semiconductor fabrication technology; Nanolithography; Lithography (semiconductor technology)

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http://iet.metastore.ingenta.com/content/journals/10.1049/mnl.2014.0412
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content/journals/10.1049/mnl.2014.0412
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