Fabrication of nanochannels using underexposed nanoimprint method
- Author(s): Zhiwen Wang 1 ; Jinkui Chu 1 ; Qianyi Wang 1 ; Ran Zhang 1 ; Yan Cui 1
-
-
View affiliations
-
Affiliations:
1:
Key Laboratory for Micro/Nano Technology and Systems of Liaoning Province, Dalian University of Technology, 116024, Dalian, People's Republic of China
-
Affiliations:
1:
Key Laboratory for Micro/Nano Technology and Systems of Liaoning Province, Dalian University of Technology, 116024, Dalian, People's Republic of China
- Source:
Volume 10, Issue 1,
January 2015,
p.
34 – 36
DOI: 10.1049/mnl.2014.0412 , Online ISSN 1750-0443
© The Institution of Engineering and Technology
Received
06/07/2014,
Accepted
27/11/2014,
Revised
20/10/2014,
Published
20/01/2015
Uniform arrays of nanochannels were made using an underexposed nanoimprint method. The nanotrenches were bended uniformly, and the degree of the collapse was controlled by the exposure time. After deposition of the sealing material, nanochannels with a dimension of 100 nm were successfully fabricated. The blocking problem was solved by adjusting the parameters of the gratings. The proposed fabrication technique can be very helpful in micro-/nanoanalysis systems.
Inspec keywords: nanofabrication; nanostructured materials; nanolithography
Other keywords: under-exposed nanoimprint; exposure time; uniform nanochannel arrays; nanoanalysis systems; nanochannel fabrication; nanotrenches; microanalysis systems; sealing material
Subjects: Nanometre-scale semiconductor fabrication technology; Nanolithography; Lithography (semiconductor technology)
References
-
-
1)
-
5. Chu, J.K., Meng, F.T., Han, Z.T., Guo, Q.: ‘Large area mold fabrication for the nanoimprint lithography using electron beam lithography’, Sci. China. Technol. Sci., 2010, 53, (1), pp. 248–252 (doi: 10.1007/s11431-009-0320-0).
-
-
2)
-
3. Wang, J., Sui, G., Mocharla, V.P., et al: ‘Integrated microfluidics for parallel screening of an in situ click chemistry library’, Angew. Chem. Int. Ed., 2006, 118, (32), pp. 5402–5407 (doi: 10.1002/ange.200601677).
-
-
3)
-
6. Cannon, D.M., Flachsbart, B.R., Shannon, M.A., Sweedler, J.V., Bohn, P.W.: ‘Fabrication of single nanofluidic channels in poly(methylmethacrylate) films via focused-ion beam milling for use as molecular gates’, Appl. Phys. Lett., 2004, 85, (7), pp. 1241–1243 (doi: 10.1063/1.1780605).
-
-
4)
-
13. Finn, A., Lu, B., Kirchner, R., Thrun, X., Richter, K., Fischer, W.J.: ‘High aspect ratio pattern collapse of polymeric UV-nano-imprint molds due to cleaning’, Microelectron. Eng., 2013, 110, pp. 112–118 (doi: 10.1016/j.mee.2013.02.065).
-
-
5)
- N. Douville , D. Huh , S. Takayama . DNA linearization through confinement in nanofluidic channels. Anal. Bioanal. Chem. , 2395 - 2409
-
6)
- J.O. Tegenfeldt , C. Prinz , H. Cao . Micro- and nanofluidics for DNA analysis. Anal. Bioanal. Chem. , 7 , 1678 - 1692
-
7)
- H. Cao , Z.N. Yu , J. Wang . Fabrication of 10 nm enclosed nanofluidic channels. Appl. Phys. Lett. , 1 , 174 - 176
-
8)
-
4. Austin, R.H., Brody, J.P., Cox, E.C., Duke, T., Volkmuth, W.: ‘Stretch genes’, Phys. Today, 1997, 50, pp. 32–38 (doi: 10.1063/1.881674).
-
-
9)
-
2. Krishnan, M., Mönch, I., Schwille, P.: ‘Spontaneous stretching of DNA in a two-dimensional nano slit’, Nano Lett., 2007, 7, (5), pp. 1270–1275 (doi: 10.1021/nl0701861).
-
-
10)
-
8. Chu, J.K., Wang, Z.W., Guan, L., Liu, Z., Wang, Y.L., Zhang, R.: ‘Integrated polarization dependent photodetector and its application for polarization navigation’, IEEE Photonics Technol. Lett., 2014, 26, (5), pp. 469–472 (doi: 10.1109/LPT.2013.2296945).
-
-
11)
-
14. Sakamoto, J., Fujikawa, N., Nishikura, N., Kawata, H., Yasuda, M., Hirai, Y.: ‘High aspect ratio fine pattern transfer using a novel mold by nano imprint lithography’, J. Vac. Sci. Technol. B, 2011, 29, (6), pp. 06FC15-1–06FC15-5 (doi: 10.1116/1.3662080).
-
-
12)
-
12. Li, X.J., You, H., Jiang, H., et al: ‘Fabrication of size controllable SU-8 nanochannels using nanoimprint lithography and low-pressure thermal bonding methods’, Micro Nano Lett., 2014, 9, (2), pp. 105–108 (doi: 10.1049/mnl.2013.0674).
-
-
13)
-
7. Meng, F.T., Guan, L., Wang, Z.W., Han, Z.T., Chu, J.K.: ‘Replication of large area nanoimprint stamp with small critical dimension loss’, Sci. China. Technol. Sci., 2012, 55, (3), pp. 600–605 (doi: 10.1007/s11431-011-4695-3).
-
-
14)
-
15. Ahn, S.H., Guo, L.J.: ‘High-speed roll-to-roll nanoimprint lithography on flexible plastic substrates’, Adv. Mater., 2008, 20, (11), pp. 2044–2049 (doi: 10.1002/adma.200702650).
-
-
15)
- J. Haneveld , H. Jansen , E. Berenschot , N. Tas , M. Elwenspoek . Wet anisotropic etching for fluidic 1D nanochannels. J. Micromech. Microeng. , 4 , S62 - S66
-
16)
-
16. Beck, M., Graczyk, M., Maximov, I., et al: ‘Improving stamps for 10 nm level wafer scale nanoimprint lithography’, Microelectron. Eng., 2002, 61, pp. 441–448 (doi: 10.1016/S0167-9317(02)00464-1).
-
-
1)
http://iet.metastore.ingenta.com/content/journals/10.1049/mnl.2014.0412
Related content
content/journals/10.1049/mnl.2014.0412
pub_keyword,iet_inspecKeyword,pub_concept
6
6
