access icon free Coulomb blockade in PtSi/porous Si Schottky barrier as a two-dimensional multi-tunnelling junction

The authors report on Coulomb blockade effect in the PtSi/porous Si Schottky barrier. A model of two-dimensional multi-tunnelling junction (2D-MTJ) can explain the blockade characteristic of this barrier. Using the SIMON simulator, the electrical characteristics of the proposed model were investigated. The results show that simulated current–voltage curves achieve a reasonable fit with the measured data and the present model can be used to study the PtSi/porous Si Schottky barrier behaviour. In accordance with both the studies, Coulomb blockade phenomenon is observed in current oscillation and single-electron effect of this device at low temperatures (5 K) is justified using the 2D-MTJ model. In addition, it indicates that by increasing the current value with temperature and for high drain voltages, PtSi/porous Si Schottky barrier behaves like a single island single-electron tunnelling (SET) junction as previously reported by Raissi et al.

Inspec keywords: elemental semiconductors; silicon; porous semiconductors; Schottky barriers; platinum alloys; silicon alloys; semiconductor-metal boundaries; tunnelling; Coulomb blockade

Other keywords: PtSi/porous Si Schottky barrier; electrical characteristics; Coulomb blockade; SIMON simulator; current–voltage curves; current oscillation; two-dimensional multitunnelling junction; PtSi-Si; temperature 5 K; single-electron effect

Subjects: Tunnelling: general (electronic transport); Electrical properties of metal-nonmetal contacts; Elemental semiconductors; Semiconductor-metal interfaces; Coulomb blockade; quantum tunnelling; Surface double layers, Schottky barriers, and work functions

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http://iet.metastore.ingenta.com/content/journals/10.1049/iet-cds.2013.0475
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