Your browser does not support JavaScript!
http://iet.metastore.ingenta.com
1887

New interpretation of structure of thermally grown silicon dioxide

New interpretation of structure of thermally grown silicon dioxide

For access to this article, please select a purchase option:

Buy article PDF
£12.50
(plus tax if applicable)
Add to cart
Buy Knowledge Pack
10 articles for £75.00
(plus taxes if applicable)
Add to cart

IET members benefit from discounts to all IET publications and free access to E&T Magazine. If you are an IET member, log in to your account and the discounts will automatically be applied.

Learn more about IET membership 

Recommend Title Publication to library

You must fill out fields marked with: *

Librarian details
Name:*
Email:*
Your details
Name:*
Email:*
Department:*
Why are you recommending this title?
Select reason:
 
 
 
 
 
Electronics Letters — Recommend this title to your library

Thank you

Your recommendation has been sent to your librarian.

© The Institution of Electrical Engineers
Published

New evidence suggesting that the structure of thermally grown silicon dioxide films may not be totally amorphous is presented. Mathematical deconvolution of the Si—O absorption at 1075 cm−1 consistently reveals two distinct Gaussian lineshapes. Possible sources for these derived peaks are discussed.

Inspec keywords: infrared spectra of inorganic solids; insulating thin films; silicon compounds; spectral line breadth; noncrystalline state structure; oxidation

Other keywords: derived peaks; SiO2; Gaussian lineshapes; thermally grown

Subjects: Infrared and Raman spectra and scattering (condensed matter); Thin film growth, structure, and epitaxy; Surface treatment and degradation in semiconductor technology; Structure of amorphous, disordered and polymeric materials; Optical properties of nonmetallic thin films

References

    1. 1)
      • I.W. Boyd , J.I.B. Wilson . Structure of ultrathin silicon dioxide films. Appl. Phys. Lett. , 320 - 322
    2. 2)
      • J.C. Phillips . Spectroscopic and morphological structure of tetrahedral oxide glasses. Solid-State Phys. , 93 - 171
    3. 3)
      • I.W. Boyd , J.I.B. Wilson . A study of thin oxide films using infrared absorption techniques. J. Appl. Phys. , 4166 - 4172
    4. 4)
      • P.H. Gaskell , D.W. Johnson . The optical constants of quartz, vitreous silica, and neutron-irradiated vitreous silica (II). J. Non-Cryst. Solids , 171 - 191
    5. 5)
      • P.H. Gaskell , D.W. Johnson . The optical constants of quartz, vitreous silica, and neutron-irradiated vitreous silica (I). J. Non-Cryst. Solids , 153 - 169
    6. 6)
      • A.G. Revesz , G.E. Walrafen . Structural interpretations for some Raman lines from vitreous silica. J. Non-Cryst. Solids , 323 - 333
    7. 7)
      • R.I. Bell , P. Dean , D.C. Hibbins-Butler . Localization of normal modes in vitreous silica, germania and beryllium fluoride. J. Phys. C , 2111 - 2118
    8. 8)
      • F. Ordway . Condensation model producing crystalline or amorphous tetrahedral networks. Science , 800 - 801
    9. 9)
      • Y. Bando , K. Ishizuka . Study of the structure of silica glass by high resolution electron microscopy. J. Non-Cryst. Solids
http://iet.metastore.ingenta.com/content/journals/10.1049/el_19870299
Loading

Related content

content/journals/10.1049/el_19870299
pub_keyword,iet_inspecKeyword,pub_concept
6
6
Loading
Print this page
This is a required field
Please enter a valid email address