High-efficiency broad-area single-quantum-well lasers with narrow single-lobed far-field patterns prepared by molecular beam epitaxy

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High-efficiency broad-area single-quantum-well lasers with narrow single-lobed far-field patterns prepared by molecular beam epitaxy

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Broad-area single-quantum-well graded-index waveguide separate-confinement heterostructure lasers were fabricated by molecular beam epitaxy. A high external quantum efficiency of 79% and stable, single-lobed far-field patterns with a beam divergence as narrow as 0.8° (1.9 times diffraction limit) for a 100 μm-wide laser were obtained under pulsed conditions.

Inspec keywords: semiconductor junction lasers; semiconductor growth; molecular beam epitaxial growth

Other keywords: diffraction limit; semiconductor laser; molecular beam epitaxy; beam divergence; single-lobed far-field patterns; external quantum efficiency; graded-index waveguide separate-confinement heterostructure lasers; high-efficiency broad-area single-quantum-well lasers

Subjects: Lasing action in semiconductors; Vacuum deposition; Design of specific laser systems; Semiconductor lasers; Epitaxial growth

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