Your browser does not support JavaScript!
http://iet.metastore.ingenta.com
1887

Stanford's ultra-low-power CMOS technology and applications

Stanford's ultra-low-power CMOS technology and applications

For access to this article, please select a purchase option:

Buy chapter PDF
£10.00
(plus tax if applicable)
Buy Knowledge Pack
10 chapters for £75.00
(plus taxes if applicable)

IET members benefit from discounts to all IET publications and free access to E&T Magazine. If you are an IET member, log in to your account and the discounts will automatically be applied.

Learn more about IET membership 

Recommend Title Publication to library

You must fill out fields marked with: *

Librarian details
Name:*
Email:*
Your details
Name:*
Email:*
Department:*
Why are you recommending this title?
Select reason:
 
 
 
 
 
Low-power HF Microelectronics: a unified approach — Recommend this title to your library

Thank you

Your recommendation has been sent to your librarian.

Stanford's approach to low-voltage CMOS shows that, without speed performance loss, significant power reductions are achieved after modifying CMOS processes to accommodate low, tuneable thresholds. A key concept is to balance the leakage power of inactive circuits with the switching power of the circuits doing the work. This requires electrical adjustment of threshold voltages and new circuit design techniques. Electrically tuneable thresholds can accommodate a wide range of applications and activity levels in a system, and can significantly improve worst case performance at low voltage. Well and substrate ties are separated from supply rails and controlled to compensate for process and ambient variations. An implementation of a self tuning system using low/tuneable threshold devices in a VLSI environment was shown. For the same switching speed, fabricated devices show significant reduction in switching power when compared to standard devices operated at a higher supply voltage. Cryogenic ULP techniques allow for insight into deep submicron effects and allow the same performance of standard 5V CMOS to be achieved at 330mV, for 1/230 of the energy. The key to high performance at low voltage is low or near-zero threshold. This requires room temperature thresholds of about -200mV for maximum performance at 77K. ULP techniques are only in their infancy and yet they have already provided a very good opportunity for increased levels of interaction among process, device, circuit and system engineers towards optimum low power microelectronic solutions.

Inspec keywords: electrical faults; VLSI; low-power electronics; CMOS integrated circuits

Other keywords: voltage 5 V; temperature 77 K; power leakage; Stanford ultra-low-power CMOS technology; electrically tuneable threshold device; voltage 330 mV; low power microelectronic solution; VLSI; temperature 293 K to 298 K; circuit switching power; submicron effect; power reduction; cryogenic ULP technique

Subjects: CMOS integrated circuits

Preview this chapter:
Zoom in
Zoomout

Stanford's ultra-low-power CMOS technology and applications, Page 1 of 2

| /docserver/preview/fulltext/books/cs/pbcs008e/PBCS008E_ch3-1.gif /docserver/preview/fulltext/books/cs/pbcs008e/PBCS008E_ch3-2.gif

Related content

content/books/10.1049/pbcs008e_ch3
pub_keyword,iet_inspecKeyword,pub_concept
6
6
Loading
This is a required field
Please enter a valid email address