Inspec keywords: field effect transistors; photolithography; etching; graphene devices; graphene; contact resistance

Other keywords: size 3 mum; cap metal layer; self-aligned graphene transistor; etch stop layer; etched stem metal layer; contact resistance; C; high gate capacitive efficiency; photolithography; metal gate-stack; self-aligned GFET; SA graphene FET

Subjects: Fullerene, nanotube and related devices; Surface treatment (semiconductor technology); Lithography (semiconductor technology); Other field effect devices